@Article{SilvaRamoCoraTrav:2016:DLFiGr,
               author = "Silva, Patr{\'{\i}}cia Cristiane Santana da and Ramos, Marco 
                         Antonio Ramirez and Corat, Evaldo Jos{\'e} and Trava Airoldi, 
                         Vladimir Jesus",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas 
                         Espaciais (INPE)}",
                title = "DLC films grown on steel using an innovator active screen system 
                         for PECVD technique",
              journal = "Materials Research",
                 year = "2016",
               volume = "19",
               number = "4",
                pages = "882--888",
                month = "July/Aug.",
             keywords = "Active screen, Adhesion, DLC, PECVD.",
             abstract = "In this work, an active screen plasma discharge system based 
                         technology was incorporated in a PECVD reactor for DLC films 
                         growth, making it a new development in DLC films deposition. In 
                         this case, the active screen system is used to seek better 
                         electrons confinement, which might result in high ions density due 
                         to the collisions number increase, leading to a possible increase 
                         in ionization. DLC films were grown on steel substrates, using two 
                         variations of this system. In order to enhance adhesion between 
                         coating and substrate, a silicon interlayer was deposited, using 
                         different bias voltages. Morphological and structural 
                         characterization was performed by scanning electron microscopy, 
                         optical profilometry and Raman scattering spectroscopy. 
                         Tribological tests were performed by nanohardness, scratch and 
                         wear tests. Results showed that the plasma confinement promoted 
                         good films adhesion, which may be related to a high 
                         sub-implantation. This might be a consequence of the pressure 
                         decrease, as well as, to the ions energy distribution narrowing.",
                  doi = "10.1590/1980-5373-MR-2015-0456",
                  url = "http://dx.doi.org/10.1590/1980-5373-MR-2015-0456",
                 issn = "1516-1439",
             language = "en",
           targetfile = "silva_dlc.pdf",
        urlaccessdate = "28 abr. 2024"
}